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Stress evolution as a function of substrate bias in rf magnetron sputtered yttria-stabilized zirconia films
Piascik, J., Thompson, JY., Bower, C., & Stoner, B. (2006). Stress evolution as a function of substrate bias in rf magnetron sputtered yttria-stabilized zirconia films. Journal of Vacuum Science & Technology A, 24(4), 1091-1095.