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Mechanical-Stress in Sio2-Films Obtained by Remote Plasma-Enhanced Chemical Vapor-Deposition
Temple, D., Reisman, A., Fountain, G., Walters, M., & Hattangady, SV. (1993). Mechanical-Stress in Sio2-Films Obtained by Remote Plasma-Enhanced Chemical Vapor-Deposition. Journal of the Electrochemical Society, 140(2), 564-567.
