RTI uses cookies to offer you the best experience online. By clicking “accept” on this website, you opt in and you agree to the use of cookies. If you would like to know more about how RTI uses cookies and how to manage them please view our Privacy Policy here. You can “opt out” or change your mind by visiting: http://optout.aboutads.info/. Click “accept” to agree.
Characterization and Failure Analysis of TSV Interconnects
From Non-destructive Defect Localization to Material Analysis with Nanometer Resolution
Krause, M., Altmann, F., Schmidt, C., Petzold, M., Malta, D., & Temple, D. (2011). Characterization and Failure Analysis of TSV Interconnects: From Non-destructive Defect Localization to Material Analysis with Nanometer Resolution. In Proc. of the 61st Electronic Component and Technology Conference, ECTC 2011 (pp. 1452 - 1458)