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Method for protecting a substrate surface from contamination using the photophoretic effect

Periasamy, R. (1994). Method for protecting a substrate surface from contamination using the photophoretic effect. (U.S. Patent No. 5366559). http://patft.uspto.gov/netacgi/nph-Parser?patentnumber=5366559

Abstract

A method for processing a substrate surface in a process chamber wherein during chemical or physical altering of the substrate surface a laser beam is projected inside the processing chamber and along a trajectory which does not contact the substrate surface in order to capture particles by means of the photophoretic effect, particles which would otherwise impinge upon and contaminate the substrate surface.

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