Low temperature chemical vapor deposition and etching apparatus and method

Abstract

An apparatus and method for the growth and etching of materials where a substrate on which a film is being deposited or which is being etched is maintained at a lower temperature than a precursor cracking temperature. The apparatus includes a susceptor with separators, made of an optically transmissive material with low thermal conductivity, such as quartz, upon which the substrates are mounted. The susceptor is heated to a precursor cracking temperature while the substrates are maintained at a lower deposition temperature by the separators. The substrates are heated by black body radiation transmitted through the separators to the substrates.